JEOL USA Press Releases

A new frontier on the head of a pin: Nanotechnology Institute at University of Alberta, Canada will explore new kinds of matter.

May 8, 2007 (Peabody, Mass.) -- For the seventh consecutive year, JEOL USA, Inc., a leader in the manufacture, sales, and service of electron microscopes and analytical instruments, has received the Omega NorthFace Scoreboard Award in recognition for its commitment to providing exemplary service and exceeding customer expectations. “We at JEOL are proud of our continuous and measurable improvement over the years,” said Patrick McGinley, Director of Service. “Supplying excellent service requires a corporate-wide commitment ...

The University of York has taken a significant step into new fields of sub-Angstrom level materials research with the opening of the York JEOL Nanocentre. The interdisciplinary research and teaching centre represents a £5.5 million investment in novel nanoscience capability by the University of York, regional development agency, Yorkshire Forward, the European Union, and by scientific instruments supplier JEOL.

April 26, 2007 (Peabody, Mass.) -- JEOL USA announced today that researchers at Harvard University’s Department of Molecular and Cellular Biology have selected JEOL as a partner in a collaborative effort to map the brain using high resolution SEM images. Harvard biologist Professor Jeff Lichtman, post-doctorate Narayanan (Bobby) Kasthuri, and University of Southern California Research Assistant Kenneth Hayworth plan to use a JEOL scanning electron microscope (SEM) to ultimately produce a 3D image of ...

(Peabody, Mass.) JEOL USA is pleased to announce that the University of the Pacific has released information on the discovery of a breakthrough testing method for identifying foreign substances in pet food. Using the JEOL DART™ Direct Analysis in Real Time mass analysis technique on the AccuTOF-DART™ mass spectrometer, a chemistry professor and graduate student analyzed some of the recalled pet food. “The timeliness of this discovery cannot be overstressed,” said Dr. Robert (Chip) Cody, ...

April 10, 2007, Peabody, Mass. -- The acquisition of a new 300 kV field emission Transmission Electron Microscope (TEM) from JEOL distinguishes Indiana University, Bloomington, Indiana as a major United States research facility where scientists can examine both biological and materials science structures at nanoscale resolution. Acquisition of the new JEOL TEM was completed in February 2007 with an NSF Major Research Instrumentation Grant awarded in parallel with a $1M investment made by the ...

March 28th, 2007, Peabody, Mass. -- JEOL USA, a leading supplier of scientific instruments in the Americas, is proud to announce that JEOL Technics, one of the company’s design and manufacturing branches in Akashima, Japan, has shipped its 10,000th Scanning Electron Microscope (SEM). Since JEOL, Ltd. was founded in 1949, more than 6,000 JEOL instruments have been installed in the United States, and more than 51,000 worldwide. JEOL USA opened in 1962 as a wholly-owned ...

March 19, 2007, Peabody, Mass. — JEOL USA hosted the spring meeting of the New England Society for Microscopy (NESM) at its Peabody, Massachusetts headquarters on Thursday, March 15. NESM, celebrating its 40th anniversary this year, is a local affiliate of the Microscopy Society of America (MSA). The organization held its first inaugural meeting in 1967 at JEOL USA. NESM is dedicated to the promotion and advancement of the science and practice of all microscopical imaging, ...

March 12, 2007, Peabody, MA — A new thermal field emission analytical SEM from JEOL, the JSM-7001F, acquires high resolution micrographs at up to 1,000,000X for applications ranging from semiconductor, metals, minerals, materials, and ceramics, to non-conductive biological samples. The JSM-7001F features a unique in lens field emission gun that delivers more than 200 nA of beam current to the sample. An extremely small probe diameter at low kV and high current is optimal for characterization ...

February 13, 2007, Peabody, MA – The high spatial resolution and flexibility of the JEOL Beam Tracer allows this new failure analysis tool to precisely locate and mark defect sites in multi-layer semiconductor devices. The Beam Tracer images marginal and failed interconnects and junctions through several complex layers. It allows measurement of individual transistors, performs electrical characterization, and includes a patented Voltage Distribution Contrast method for devices produced under the 65nm design rule. A precision ...