Electron beam lithography uses a focused electron beam to pattern the surface of a material. As electron beams can be very tightly focused and small beam sizes achieved, electron beam lithography can be used to create very intricate structures for a wide variety of nanofabrication applications.

Direct write lithography is a technique used to pattern a substrate without the use of a photomask. Take a look at our blog to learn more about it.

Explore the sustainability of metal 3D-printing, its benefits, and the role of powder reclamation. Dive into JEOL's innovations for a greener manufacturing future.

Professor Simon Watkins' lab at University of Pittsburgh, in collaboration with JEOL USA, has been developing novel ways to analyze biological structures in 3D, utilizing correlative FESEM and fluorescence microscopy. The paper “Correlative Fluorescence and Electron Microscopy in 3D – Scanning Electron Microscope Perspective” (Current Protocols in Cytrometry) describes how the ability to correlate fluorescence microscopy and electron microscopy data obtained on biological specimens bridges the resolution gap between the data obtained by these different imaging techniques.

Microscopy work for Lou Brus Quantum Dots research done in collaboration with J. Murray Gibson on JEOL TEM in 1984

Middle and High School students from Massachusetts to present their research at Microscopy conference M&M 2023