JEOL USA Press Releases

August 23, 2007 (Peabody, Mass.) -- JEOL USA received a distinguished visitor at its Peabody, Massachusetts office on Tuesday, August 21st, when the 2007 Ernst Ruska Prize winner, Professor Hiroshi Jinnai of Kyoto Institute of Technology, visited JEOL’s U.S. headquarters. Dr. Jinnai, an invited speaker at the American Chemical Society Fall conference held in Boston during the week of August 20th, uses a JEOL Transmission Electron Microscope (TEM) in his nanomaterials research at the ...

Wesleyan’s Advanced Instrumentation Center has scoped out better way to conduct infinitesimal scientific research. In the past six months, the center has acquired a new, state-of-the art scanning electron microscope (JEOL JSM-6390LV SEM) for 3-D imaging, and a transmission electron microscope (JEOL JEM-1011 TEM) for 2-D sample images.

August 2, 2007 (Peabody, Mass.) -- JEOL USA, a leading supplier of electron microscopes and scientific instruments for nanotechnology, announced today that it has completed installation and acceptance of its first thermal field emission electron microprobe in the United States. The microprobe was installed at NIST in Gaithersburg, Maryland, in one of the world’s most technically advanced laboratories for developing new technologies and standards for a wide range of nanotechnology fields. A fully-automated, high-throughput versatile ...

June 25, 2007 (Peabody, Mass.) -- JEOL USA has recently published the third edition of its popular AccuTOF-DART Direct Analysis in Real Time mass spectrometry applications notebook. The updated booklet contains new data on chemical reaction monitoring and detection of the peroxide explosives TATP and HMTD. A compilation of 28 applications notes describes analyses performed using the AccuTOFTM time-of-flight mass spectrometer with the DART® ion source. Samples analyzed include pharmaceuticals, illicit drugs, foods, flavors, fragrances, industrial ...

New ink sampling technique takes a bite out of time

July 10, 2007 (Peabody, Mass.) -- JEOL USA has introduced a new high resolution direct write e-beam lithography system to complement its family of spot beam, vector scan systems and mask production tools. The new JBX-5500FS direct write lithography tool writes patterns at a minimum line width of 10nm at 50kV on up to 100mm substrates. The PC-controlled operating platform features a simple graphical user interface (GUI) for pattern design and machine control. Complete line of ...

JEOL USA (Peabody, Mass.) today announced a direct-write e-beam lithography system targeted at research labs and universities. The JBX-5500FS system is capable of 10 nm resolution at 50 kV on silicon pieces or wafers up to 100 mm.

A team of researchers from the Department of Energy's Lawrence Berkeley National Laboratory, Purdue University and Hysitron Inc. in Minneapolis are using special instrumentation with the JEOL 3010 in situ transmission electron microscope to correlate high-resolution load-displacement measurements with individual video frames, showing how nanoscale volumes of aluminum deform under stress from a diamond "nanoindenter".

A new frontier on the head of a pin: Nanotechnology Institute at University of Alberta, Canada will explore new kinds of matter.

May 8, 2007 (Peabody, Mass.) -- For the seventh consecutive year, JEOL USA, Inc., a leader in the manufacture, sales, and service of electron microscopes and analytical instruments, has received the Omega NorthFace Scoreboard Award in recognition for its commitment to providing exemplary service and exceeding customer expectations. “We at JEOL are proud of our continuous and measurable improvement over the years,” said Patrick McGinley, Director of Service. “Supplying excellent service requires a corporate-wide commitment ...