January 16, 2007, Peabody, MA -- For the first time in its 50+ year history, JEOL USA will be exhibiting at the IPC Printed Circuits Expo/APEX (February 18-22, 2007, Los Angeles, CA). JEOL USA will showcase an argon ion beam cross section polisher (CP) for specimen preparation prior to high magnification imaging with the scanning electron microscope (SEM).
The JEOL CP produces precise cross sections of both soft and hard materials, as well as composites. Solder bumps, wirebonds, and thin film specimens are routinely prepared without distortion, making it possible to clearly image adhesions, interfaces, microstructures, metals distribution, and crystal structures for defect and failure analysis.
More information on the CP can be found at http://www.jeolusa.com/tabid/257/Default.aspx.
JEOL, a leading global supplier of tungsten and field emission electron microscopes for research and defect analysis, will exhibit essential imaging solutions for the industry in booth #2566.
