Focused Ion Beam (FIB) is used to prepare very thin – typically 100nm or less - samples for the Transmission Electron Microscope. JEOL’s FIB-SEM combines sample preparation with high resolution Scanning Electron Microscopy imaging at nanometer-scale resolution, making it possible for the exact region of interest, such as a grain boundary or defect, to be investigated.
The FIB technique uses a finely focused beam of ions to mill a region of interest, while the SEM uses a focused beam of electrons for imaging. The system can be operated at low beam currents for imaging or at high beam currents for site-specific milling.
JEOL FIB-SEM systems are widely used in the semiconductor industry, and in both materials and biological sciences applications. JEOL offers three different models:
JEOL’s new
JIB-PS500i FIB-SEM offers the cutting edge in sample preparation, imaging and analysis. This multipurpose FIB-SEM features a large chamber/stage and TEM-Linkage enables a new high-throughput, robust workflow from specimen preparation to TEM imaging.
The
JIB-4700F Multi Beam System is used for materials to enable morphological observations in three dimensions, and elemental and crystallographic analyses for a variety of specimens.
For frozen specimens, JEOL’s new
CRYO-FIB-SEM incorporates a liquid nitrogen cooling stage and cryocooled specimen transfer mechanism with built-in sputter coating function. Coupled with JEOL’s Cryo-ARM, a powerful workflow solution for cryo-electron microscopy can be realized.