Electron Optic Documents

Dose Painting creates precise exposure patterns by synchronizing an electrostatic blanker to a STEM scan.

An e-ABF is observable as a "live image" with real-time signal processing of ABF and BF signals and it shows enhanced contrast of light atoms.

In recent years with the advances in both EBSD and FE-SEM technology there have been renewed efforts at analyzing nanostructured materials at high temperatures using dedicated specimen holders and sub-stages. Although the techniques for EBSD analysis of bulk materials using heating stages have been well established [1], the requirements for nanostructured materials preparation and analysis obviously differs from bulk materials and can benefit from a miniaturized heater with smaller sample/higher temperature capacity capability [2].

The Electrostatic Dose Modulator (EDM) is a fast beam blanking system with a pre-sample electrostatic deflector, including electronics and software control.

The Electrostatic Dose Modulator (EDM) is a fast beam blanking system with a pre-sample electrostatic deflector that includes electronics and software control. With EDM, the beam can switch on or off in less than 50 ns. This 100,000x improvement in blanking speed results in immediate enhancement in the clarity of data taken at fast exposure times. Moreover, EDM includes a desktop control knob that allows users to easily attenuate electron dose without affecting imaging conditions. The included software interface gives TEM and STEM users direct access to EDM’s pulse width modulation parameters providing exceptional control over the dose rate on their samples – invaluable feature for beam sensitive specimen imaging and analysis.

With Dose Painting using EDM Synchrony, the user can define an arbitrary “mask,” freely and independently controlling the beam current in every pixel. This lets you reduce the current in heavy-element regions, reducing pileup and allowing EDS acquisition from light-element and heavy-element regions in a single scan.

Electron Backscatter Diffraction (EBSD) is a powerful technique capable of characterizing extremely fine grained microstructures in a Scanning Electron Microscope (SEM). Electron Backscatter Patterns (EBSPs) are generated near the sample surface, typically from a depth in the range 10 – 50nm. In order to achieve effective analysis it is imperative to combine high beam current with small probe size to achieve high spatial resolution in a time efficient manner.

Utilizing Monte Carlo Modeling of electron trajectories Electron Flight Simulator is a software tool designed to make your job easier. It can help you understand difficult samples, show the best way to run an analysis, and help explain results to others. With it you can see how the electron beam penetrates your sample, and where the X-ray signal comes from, for a wide variety of microscope conditions. You can model multiple layers, particles, defects, inclusions, and cross-sections. Any sample chemistry can be modeled.

JEOL’s in column Upper Electron Detector (Through The Lens Detector) provides not only ultra-high resolution imaging but also includes a user selectable energy filter allowing the user to study a sample under different contrast mechanisms. For example, this energy filter allows the user to select low energy secondary electrons (SE) to enhance topographic features or high energy backscatter electrons (BSE) to highlight atomic number contrast. This detector is especially useful at lower kVs.

The JEOL Environmental Airlock system allows for the simple transfer of reactive specimens to the SEM without being exposed to air. For specimens where any exposure to air or moisture can alter or destroy the structure, this system provides a cost effective and simple method to bring specimens from a glove box directly to the SEM.