Fabrication of Grating Patterns by E-beam Lithography
Along with the development of optical communication, optical integrated devices are now making rapid progress, and especially the grating, which is of a periodic structure, is now playing an important role in a wide variety of fields. In recent years, there is an increasing need for smaller grating pitches, and not only semiconductors bit also a variety of materials are used for substrates. Recently, we have established a technique to finely control the grating pitch to 1nm, less than the pattern data unit (5 nm), by E-beam (E-B) lithography. Also, the fabrication of gratings with phase shift has been simplified by changing the stage shift distance.