NANO PMGI Resists: Positive Radiation Sensitive Resists for Lift-off, Planarization, and Multilayer Applications
The PMGI SF Series of resist is widely used in multilayer DUV flood exposure processes for lift-off applications, but is also suitable for single layer or multilayer e-beam and x-ray use. It is used in planarization schemes, thin film head metallization, T-gate processes, air-bridge construction, microelectromechanical device fabrication, and SAW manufacture. Both cap-on and cap-off processes are available. It is also finding uses as an SOG replacement and as an LCD alignment layer as it has reasonable dielectric properties.