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NeoScope Benchtop SEM
FE SEM
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SEM-FIB
JIB-4700F / MultiBeam
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Elemental Analysis
Transmission Electron Microscopes (TEM)
120 kV
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200 kV
NEOARM
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JEM-F200 F2
JEM-2100Plus
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JEM-ACE200F
JEM-Z200MF
300 kV
JEM-ARM300F2
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Analytical & Data Optimization
JEOL-IDES Luminary Ultrafast TEM/Dynamic TEM
TEMPO
PULSE System
Environmental Control Solutions
Focused Ion Beam
CRYO-FIB-SEM
JIB-PS500i
JIB-4700F
Sample Preparation Tools
Cross Section Polisher
Vacuum Evaporator
Smart Coater
Carbon Coater
UV Cleaner
Auto Fine Coater
Nuclear Magnetic Resonance
JNM-ECZL series FT NMR
Probes
ROYALPROBE
ROYALPROBE HFX
Cryogenic Probes for NMR
Liquids/Solution State Probes
AutoMAS Solids Probe
HCN MAS and HXY NMR Probes
Solid State NMR Probes
NMR Probe Key Features and Applications
Delta NMR Software
CRAFT for Delta
NMR in pharma
qNMR
Magnets
Sample Changers
Cryogen Reclamation System
Electron Spin Resonance
JES-X330
JES-X320
JES-X310
Mass Spectrometers
AccuTOF DART
AccuTOF DART Technology
AccuTOF DART Ionization Mechanisms
AccuTOF Time-of-Flight Mass Analyzer
AccuTOF DART High-Resolution Accurate Mass
AccuTOF GC-Alpha
msFineAnalysis AI
AccuTOF GCxGC MS
AccuTOF LC-Express
GC/Single-Quadrupole Mass Spectrometer
NETZSCH And JEOL
msFineAnalysis iQ
GC/Triple-Quadrupole Mass Spectrometer
msFineAnalysis iQ
MALDI SpiralTOF TOF/TOF
msRepeatFinder Polymer Analysis Software
MALDI Imaging SpiralTOF
UltraFOCUS DIOXIN Analysis
Microprobe (EPMA) and Auger
JXA-iHP200F
JXA-iSP100
JAMP-9510F
Soft X-Ray Emission Spectrometers
Photomask / Direct Write Lithography
Electron Beam Lithography
JBX-A9
JBX-8100FS
JBX-3050MV
Elemental Analysis
Embedded EDS for SEM
Gather-X Windowless EDS
Soft X-ray Emission Spectrometer
ElementEye JSX-1000S XRF
Correlative Microscopy Solutions
Additive Manufacturing 3D Printer
Medical Equipment
BioMajesty Series
JCA-6010/C
JCA-BM 6050
JCA-9130/C
JCA-BM 2250
JCA-BM 8000 Series
Industrial Equipment
High-Power Electron Beam Sources
Electron Beam Sources
BS-60050EBS Electron Beam Source
EB Source Power Supply
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Rotary Sensor
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Lake Superior State University
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Reference Data
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Non Uniform Sampling (NUS)
Mass Spectrometry Basics
NMR Basics
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Photomask / Direct Write Lithography (76)
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JEOL Resources
Documentation in support of your JEOL product.
NanoMeter - the newsletter of the Cornell NanoScale Science & Technology Facility
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1 MIN READ
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889
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October 22, 2020
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Electron Beam Lithography
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Photomask / Direct Write Lithography
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October 2004, Volume 15, Number 2
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